US 2,002,139,303 · Filed 2002-01-31
Deposition apparatus and deposition method
A deposition apparatus is provided for manufacturing an organic compound layer having a plurality of function regions. The deposition apparatus includes a plurality of evaporation sources within a deposition chamber, for enabling continuous formation of respective function regions comprised of organic compounds and, further, formation of a mixed region at an interface between adjacent ones of the function regions. With the deposition apparatus having such fabrication chamber, it is possible to prevent impurity contamination between the functions regions and further possible to form an organic compound layer with an energy gap relaxed at the interface.
Patent details
- Publication number
- US 2,002,139,303
- Filing date
- 2002-01-31
- Grant date
- Application — not yet granted
- Assignee
- Shunpei Yamazaki / Satoshi Seo / Mayumi Mizukami
- Inventor(s)
- YAMAZAKI SHUNPEI, SEO SATOSHI, MIZUKAMI MAYUMI
- CPC class
- A47J31/4403
Want to file your own patent?
Run your idea through our free scanner — we’ll show you which existing patents are conceptually closest, including this one if it’s a match.
Free patentability scanRelated patents in this cluster
- US 8,757,287: Electric-motor kitchen appliance comprising an electric or electronic control
- US 5,325,765: Beverage filter cartridge
- US 9,521,923: Brewable beverage making cup adaptor for cartridge type coffee making machines and cartridge type coffee making machine
- US 5,897,899: Cartridges containing substances for beverage preparation